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Ultra-High and Extreme-High Vacuum pumps

Ultra-high vacuum pumps

We offer a range of ion pumps, NEG-Ion combination pumps, titanium sublimation pumps, non-evaporable getter pumps and accessories through Gamma Vacuum.

Capture pumping technologies create ultra-high vacuum (UHV) and extreme-high vacuum (XHV) environments for a variety of applications, ranging from portable mass spectrometers to large scale particle accelerators. They can create the lowest possible vacuum at an economical cost.

HyTan NEG-Ion Pumps

NEG pumps deliver high pumping speeds for H2 but also chemically active gases such as N2, O2 and CO, whilst ion pumps efficiently extract all gas species including noble gases and methane. HyTan NEG-Ion Pumps combine both technologies into one UHV pump.

With exchangeable modules the NEG pumps offer hydrogen pumping speed ranges from 100 – 500 l/s, and with noble and conventional diode elements for the ion pump module, this innovative technology is suitable for a wide range of UHV and XHV applications.

HyTan NEG-Ion pumps are available in two main types, differentiated primarily by their diameter, which define their pumping performance and configuration options:

HyTan NEG-Ion Pump family picture

Ø36 mm:The smallest pump diameter, offering hydrogen pumping speeds ranging from 110 to 750 l/s. The pump is equipped with an ion pump providing either 1 or 3 l/s pumping speed. Due to its compact size, and the option of assembling the pump inside a chamber, the HyTan NEG-Ion Pump is a perfect fit for UHV environments where space is restricted. 

Ø98 mm: A larger-diameter pump consisting of six NEG cartridges combined with an ion pump module delivering up to 20 l/s nitrogen pumping speed. Its modular design allows easy upgrading from a pure NEG pump to a NEG-ion pump, or vice versa, providing maximum flexibility for future system requirements.

Non-evaporable getter (NEG) pumps

Non-Evaporable Getter (NEG) pumps are ultra and extreme high vacuum (UHV/XHV) pumps designed to remove hydrogen and other reactive gases such as nitrogen or oxygen. 

A specific combination of Zirconium, Vanadium and Iron have been found to work best for HV and UHV environments. The amount of material used controls the speed and capacity of the NEG pump, but typically range from 55 to 412 l/s and capacity from 630 to 3600 Torr l/s.

As NEG’s become saturated with gases, they can be reactivated without venting to atmosphere.

The NEG Pumps come in 2 variantions that cover a broad range of performance requirements:

The compact 1 NEG cartridge pump, 34 mm diameter, installed on a DN CF40 flange, and provides hydrogen pumping speeds from 55 to 470 l/s, using either pressed or sintered NEG materials to meet specific application and lifetime needs.

The large 6 NEG cartridge pump, 96 mm diameter, complements the compact range offered by Gamma Vacuum, with its proven HyTan NEG pump design. These pumps use a 96 mm diameter NEG section and deliver 725 to 2000 l/s hydrogen pumping speed. HyTan NEG pumps are available with DN CF100 or DN CF160 flanges and incorporate an optimized heat shield structure that ensures superior thermal distribution during activation and consistently high pumping performance. The modular design also allows convenient upgrading to a HyTan NEG-Ion pump.

Ion pumps

Also known as sputter ion pumps or ion getter pumps.

Those are capture pumps that ionize gases using an anode/cathode array.

Ions sputter reactive cathode materials, creating a chemical reaction that turns the ionized gases into solid compounds. Those compounds no longer contribute to the pressure of the vacuum system and are permanently captured within the ion pump.

Ion pumps can operate from 10-5 to 10-12 mbar and range in size from 0.2 to 1,200 l/s of nitrogen.

Gamma Vacuum Titan Ion Pump

Titan ion pump

Titanium sublimation pumps

Gamma Vacuum Titanium sublimation ion pump

Titanium sublimation ion pump

Operate by heating a titanium filament and subliming (converting from solid to gas phase) titanium molecules onto a surface.

Sublimed titanium molecules are then available to chemically react with reactive gases, like oxygen and nitrogen, and disassociate and diffuse hydrogen.

TSP’s can operate from 10-5 to 10-12 mbar and have pumping speeds in excess of 10,000 l/s of hydrogen.

DIGITEL ion pump controllers

A range of controllers have been developed to regulate, power and manage your vacuum application.

Whether you’re running a single, or multiple pumps, our range of controllers have been designed to ensure you maintain steady voltage and current levels, with a range of integration protocols, safety features and easy to use navigation interface.

The advanced SPC-ION, QPC, MPCq, and TSP controllers will help you unlock the peak performance of your vacuum system.

  • DIGITEL SPC-ION controller for managing single ion pumps up to 75 l/s
  • DIGITEL QPC quad pump controller for managing up to 4 ion pumps
  • DIGITEL MPCq multiple pump controller high current control for up to 4 large ion pumps
  • TSP controller manage up to 2 TSP pumps (= 6 TSP filaments)

UHV (ultra-high vacuum) accessories

Designed to work in perfect unison with the Gamma Vacuum portfolio of products.

This range of accessories will further support the performance, reliability, and efficiency of your vacuum system.

  • High Voltage cables – built inhouse our range of high voltage cables are tailor made to fit a diverse range of applications and power requirements.
  • TSP cables – Long lasting, robust and reliable cable for our titanium sublimination pumps.
  • Splitter box - Split the power going to ion or NEG pumps for parallel operation.
  • TSP shroud –The shroud is coated with the sublimated titanium, creating a large active surface providing superior hydrogen pumping speed.

Ultra High Vacuum Pump key features

Mechanical vibration eliminated

Capture pumps have no moving parts. Vibration from moving parts and electrical noise is eliminated

High radiation tolerance

Capture pumps are built with radiation tolerant materials in excess of 108 Gray. Connectors and cables are also built with radiation tolerant materials for years of continuous operation

High temperature tolerance

Without any special consideration, capture pumps can be baked to 250 °C. Removing the magnets allows for hotter bakes up to 450 °C. Long hot bakes are critical to every UHV system

Regular maintenance eliminated

Capture pumps require virtually no maintenance and avoid costly vacuum events because they are sealed from atmosphere, saving time, money and resources

Low initial operational costs

Initial cost is typically less than comparable specifications of other types of vacuum pumps. They use minimal or no power for years of low cost operation

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