Ganymede harsh-duty dry pump
Global benchmark in vacuum innovation
Next-generation platform for harsh fab applications
Built on an entirely re-engineered platform, Ganymede features a high‑efficiency powertrain, an extensive sensor network, and a novel pumping mechanism that enables reliability and control in demanding fab environments.
Delivering lower total cost of ownership (TCoO), predictive intelligence, and stable operation, Ganymede is designed to support smarter, more sustainable semiconductor production.
Key Features and Benefits:
High Reliability
High Velocity Roots and Microclaw™ technology for unrivalled powder handling leading to up to 3 x better powder handling capabilities for uninterrupted performance.
Low Total Cost of Ownership
Optimised power, water and nitrogen consumption significantly reduces operating costs. Offering 50% energy savings, 40% reduction in PCW usage, up to 25% reduction in nitrogen use.
Small Footprint
Compact, space saving design. Ganymede offers a 30% smaller footprint enabling higher chamber density in the subfab, increasing productivity per square foot.
Enhanced Data, Sensors and Intelligence
Delivering real-time insights through predictive maintenance leading to optimised performance.
Enhanced Sustainability
Low PFAS content and up to 49% reduction in customer Scope 2 CO2 equivalent lifecycle emissions supporting fab-wide environmental objectives and long-term sustainability strategies.
Built for the most challenging semiconductor processes
PECVD, ALD, PEALD, SACVD, LPCVD, Epitaxy
Ganymede is engineered to withstand the toughest chemistries and by‑products:
- Powders – High‑torque powertrain and smart powder management move heavy powder loads without excessive energy use.
- Condensables – Temperature‑profile management minimises deposition on precision components.
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FAQs
Common questions about Ganymede Harsh-Duty Dry Vacuum Pump
Read the answers to some of the most popular questions other customers have had.
What is the Edwards Ganymede dry pump?
Ganymede is a next-generation harsh-duty dry vacuum pump designed for advanced semiconductor manufacturing. It combines a high-efficiency powertrain, intelligent monitoring, and enhanced process handling to deliver reliable performance in demanding subfab environments.
What are dry pumps used for in a fab or subfab environment?
Dry vacuum pumps provide the essential vacuum required for semiconductor process chambers, supporting deposition (CVD, ALD, PEALD), etch, epitaxy and other high-temperature or high-byproduct tools. In the subfab, they evacuate process gases, powders and condensables safely away from the chamber, stabilise process pressures, and maintain continuous tool uptime. Their oil-free design prevents contamination, making them the standard for modern semiconductor manufacturing.
What challenges do dry pumps face in harsh semiconductor processes?
Dry pumps operating on CVD, ALD, SACVD and epitaxy tools must cope with heavy powders, condensable byproducts and corrosive chemistries. These can cause deposition, erosion or torque overload if the pump is not designed for harsh duty.
What real-world TCoO gains can we expect from the Edwards Ganymede pump?
From next-gen harsh-duty platforms, expect significantly better powder handling, fewer cleans, and notable reductions in energy, PCW and nitrogen—translating into lower TCoO and higher uptime.
For example, this platform delivers up to 60% energy savings, 40% less PCW and 25% less N₂ versus previous generation versus Edwards iXH dry pump, with up to 6× better powder handling and a 30% smaller footprint; Scope 2 CO₂e can drop by up to 49%.
How do dry pumps handle heavy powder loads from PECVD or SACVD?
High-torque drives, optimised screw/scroll/pin profiles, controlled temperature gradients, and adaptive speed control move powders without stalling, while minimising agglomeration and chamber backpressure.
Why is temperature management important for condensable byproducts?
Condensables can solidify inside the pump if temperature zones are not tightly controlled. Advanced dry pumps use managed thermal profiles to minimise deposition and protect critical tolerances. This reduces maintenance and improves long-term reliability.
How is condensable byproduct buildup in dry vacuum pumps prevented?
By actively managing temperature profiles across stages, keeping lines and critical tolerances above dew points, and scheduling purge/clean cycles triggered by sensor thresholds.
What protects dry pumps from corrosive process gases?
Proprietary coatings and surface treatments on critical components, careful material selection, and controlled purges that dilute/react neutralise corrosives before they reach sensitive internals.
Will a new dry pump integrate with existing fab controls?
Yes, look for open digital interfaces (e.g., EtherNet/IP, Modbus/TCP), remote monitoring hooks, and simple utility connections for drop-in retrofit and fab-wide visibility.
How can a dry pump help lower Scope 2 emissions?
Lower energy draw per chamber and demand-based utilities (N₂, PCW) directly reduce electricity use and associated CO₂e. Advanced models quantify savings for sustainability reporting.
What should you keep in mind when placing a dry vacuum pump in harsh conditions?
Pumps must be installed with:
Adequate cooling and thermal clearance
Correct exhaust management (line sizing, backflow protection, abatement)
Reliable access to nitrogen and cooling water
Sufficient service space
Protection from corrosive or particulaterich airflow in the subfab
When choosing a pump for harsh duty, look for strong torque, intelligent sensors, corrosion-resistant internals and controlled temperature profiles—core elements of the Ganymede platform.
Want to learn more about Ganymede?
Discover our new Ganymede product line in the innovation hub, keep informed about its development, and find out more about the technology driving this product.