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    • Our research at AVS72
    LOCAL NEWS

    Our research at AVS72: Andrew Chew presents “Feasibility of Turbomolecular Deceleration as an Intrinsic Measurement of System Pressure”

    UK | 09 November 2026 | 2 min

    Could a turbomolecular pump help us understand system pressure in a new way?
    At the AVS 72nd International Symposium & Exhibition in Pittsburgh, Pennsylvania, our Principal Scientist in the Scientific Vacuum Division, Andrew Chew, will share our latest research exploring this possibility.

    Our paper (ID 89652), “Feasibility of Turbomolecular Deceleration as an Intrinsic Measurement of System Pressure”, is part of the VT-ThA: Vacuum Technology Flow and Pumps session within the Vacuum Technology topic.

    The research will be submitted for publication in the Journal of Vacuum Science and Technology B.

    Turbomolecular pump

    What are we exploring?

    We are exploring whether the way a turbomolecular pump (TMP) slows down with its drive power switched off can give us an indication of system pressure. In other words, could the pump's change in rotational speed tell us something useful about the vacuum?

    To investigate, we measure how different turbomolecular pumps decelerate and examine the factors that influence this behaviour: pump design, rotational speed, suspension type, inlet and exhaust pressures, and the gas being pumped. Our focus is on whether using these measurements to provide indicative pressure readings is feasible.

    Meet the authors behind the research:

    • Andrew Chew, Principal Scientist, Scientific Vacuum Division, Edwards Ltd.
    • Flo Barber, Placement Student at Edwards Ltd., with the University of Bath.
    • Andy Cobbett, Product Development Specialist, Scientific Vacuum Division, Edwards Ltd.
    • Sam Lodge, Senior Development Engineer, Edwards Ltd.
    • Paul Smith, Principal Technologist, Edwards Ltd.
    • James Healy, University of Bristol.

     

    About AVS72

    The AVS International Symposium and Exhibition provides THE platform for discussing state-of-the-art advances in atomic-scale processing, characterization, measurement, and simulation of materials, surfaces, interfaces, and devices.