Plasma Enhanced Chemical Vapor Deposition (PECVD) is a process that deposits thin films from a gas state to a solid state on some substrate. There are some chemical reactions involved in the process which occur after creation of a plasma of the reacting gases. The plasma is generally created by RF (AC) frequency or DC discharge between two electrodes where in-between place is filled with the reacting gases.Basically Processing plasmas are typically operated at pressures of a few milliTorr to a few Torr