Edwards advanced semiconductor vacuum pumps have been field-proven to perform to the highest operating standards. Reliability and high performance are achieved by extending service life, improving uptime and increasing productivity, while minimizing footprint and cost of ownership.
The iH Series offers high reliability for difficult processes, such as PECVD and LPCVD, where particulate, condensable and corrosive by-products are present.
The iH system operates at pressures between atmospheric and ultimate vacuum with no lubricating or sealing fluid in the pumping chamber. This ensures a clean pumping system without back-migration of oil into the system being evacuated.
The iH80 system has an HCDP80 dry pump; The HCDP pump has enclosed, water-cooled motors. The iH system is therefore suitable for applications in clean environments where fan cooling of motors is unacceptable.
The iH system has a gas system which introduces purge gas into the HCDP pump. This gas system is suitable for use on harsh duty processes. If you use the iH system on light or medium duty processes, you can use the economiser gas mode to reduce the consumption of purge nitrogen by the pumping system.
You can manually control the iH system through the Pump Display Terminal. Alternatively, you can use your process tool or other control equipment to control the operation of the iH system through an Interface Module or through an iM Communications Module accessory or you can use the iH Single Equipment Monitor accessory to control the operation of the iH system.
- Load Lock
- PVD Process
- PVD Pre-clean
- Implant Source
- HDP CVD
Contact Edwards for advise on the suitability of the iH system for any particular application.